Magnesium oxide (single crystal substrate), ≥99.9% trace metals basis, L × W × thickness 10 mm × 10 mm × 0.2 mm
- CAS
- 1309-48-4
- Formula
- MgO
- MW
- 40.3 g/mol
ZX-017341
Application
Chemicals for electronics, PCB and semiconductors
High-purity acids, etchants, cleaning solvents, photoresist solvents and specialty metals for electronics assembly, display and semiconductor work.
Products used in electronics, PCB and semiconductors
961–984 of 2,154 products
Magnesium oxide (single crystal substrate), ≥99.9% trace metals basis, L × W × thickness 10 mm × 10 mm × 0.5 mm
- CAS
- 1309-48-4
- Formula
- MgO
- MW
- 40.3 g/mol
ZX-017342
Magnesium oxide (single crystal substrate), ≥99.9% trace metals basis, L × W × thickness 10 mm × 10 mm × 1 mm
- CAS
- 1309-48-4
- Formula
- MgO
- MW
- 40.3 g/mol
ZX-017343
Magnesium oxide sputtering target dia x thickness 2 inch × 2 mm, ≥99.9%
- CAS
- 1309-48-4
- Formula
- MgO
- MW
- 40.3 g/mol
ZX-016215
Magnesium oxide sputtering target dia x thickness 3 inch × 2 mm, ≥99.95%
- CAS
- 1309-48-4
- Formula
- MgO
- MW
- 40.3 g/mol
ZX-016216
Magnesium oxide, (single crystal substrate), 10 x 10 x 0.2 mm, Orientation
- CAS
- 1309-48-4
- Formula
- MgO
- MW
- 40.3 g/mol
ZX-017346
Magnesium oxide, (single crystal substrate), 10 x 10 x 0.5 mm, Orientation
- CAS
- 1309-48-4
- Formula
- MgO
- MW
- 40.3 g/mol
ZX-017347
Magnesium oxide, (single crystal substrate), 10 x 10 x 0.5 mm, Orientation, 99.99%
- CAS
- 1309-48-4
- Formula
- MgO
- MW
- 40.3 g/mol
ZX-017348
Magnesium oxide, (single crystal substrate), 10 x 10 x 1.0 mm, Orientation: +/-0.3degree
- CAS
- 1309-48-4
- Formula
- MgO
- MW
- 40.3 g/mol
ZX-017349
Magnesium sputtering target, diam. x thickness 25.4mm (1.0in) x 1 mm, 99.9%
- CAS
- 7439-95-4
- Formula
- Mg
- MW
- 24.3 g/mol
ZX-016217
Magnesium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7439-95-4
- Formula
- Mg
- MW
- 24.3 g/mol
ZX-016218
Manganese sputtering target, diam. x thickness 2 inch x 0.250 inch, 99.95%
- CAS
- 7439-96-5
- Formula
- Mn
- MW
- 54.94 g/mol
ZX-016219
Manganese sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9%
- CAS
- 7439-96-5
- Formula
- Mn
- MW
- 54.94 g/mol
ZX-016220
Manganese sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7439-96-5
- Formula
- Mn
- MW
- 54.94 g/mol
ZX-016221
Questions
Buying for electronics, PCB and semiconductors
What container types do high-purity acids ship in?
Electronic grade acids are filled into pre-cleaned HDPE or PFA bottles and drums so the container does not leach metals into the product. Bottle size and closure type affect cleanliness, so state your preferred pack when you request a quote.
Can I get a lot-specific trace metal report?
Yes. For electronic grade material the COA reports measured values for each specified element, usually by ICP-MS, rather than a generic statement of compliance. Ask for the full element list if your process is sensitive to a metal that is not routinely reported.
Do you supply sputtering targets or only chemicals?
Our focus is chemicals and high-purity metals in powder, granule or ingot form. Indium tin oxide and some metals can be supplied as powders or pieces for target fabrication. Finished bonded targets are quoted on request through specialist producers.
Other applications
Pharmaceutical Manufacturing and QCAgrochemicals and Crop ProtectionWater and Wastewater TreatmentPaints, Coatings and InksTextiles, Dyes and LeatherFood, Beverage and NutritionCosmetics and Personal CareResearch Labs and UniversitiesOil, Gas and PetrochemicalsPolymers, Plastics and RubberBatteries and Energy StorageMining, Mineral Processing and MetallurgyDiagnostics, Life Science and Biotech