Application
Chemicals for electronics, PCB and semiconductors
High-purity acids, etchants, cleaning solvents, photoresist solvents and specialty metals for electronics assembly, display and semiconductor work.
Products used in electronics, PCB and semiconductors
769–792 of 2,154 products
Indium phosphide (single crystal substrate), (100) ± 0.5o
- CAS
- 22398-80-7
- Formula
- InP
- MW
- 145.79 g/mol
ZX-017096
Indium phosphide (single crystal substrate), (111)B ± 0.5o
- CAS
- 22398-80-7
- Formula
- InP
- MW
- 145.79 g/mol
ZX-017097
Indium phosphide substrates, N-type, contains sulphur as dopant, diam. × thickness 50.5 mm × 350 μm
- CAS
- 22398-80-7
- Formula
- InP
- MW
- 145.79 g/mol
ZX-017098
Indium phosphide substrates, semi insulating, contains iron as dopant, diam. × thickness 50.5 mm × 350 μm
- CAS
- 22398-80-7
- Formula
- InP
- MW
- 145.79 g/mol
ZX-017099
Indium sputtering target, diam. x thickness 25.4 mm x 10 mm, 99.99%
- CAS
- 7440-74-6
- Formula
- In
- MW
- 114.82 g/mol
ZX-016190
Indium sputtering target, diam. x thickness 25.4mm (1.0in) x 1 mm, 99.9%
- CAS
- 7440-74-6
- Formula
- In
- MW
- 114.82 g/mol
ZX-016191
Indium sputtering target, diam. x thickness 50 mm x 6 mm, 99.99%
- CAS
- 7440-74-6
- Formula
- In
- MW
- 114.82 g/mol
ZX-016192
Indium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7440-74-6
- Formula
- In
- MW
- 114.82 g/mol
ZX-016193
Indium tin oxide coated, glass substrate, 10 x 10 x 0.7 mm3
- CAS
- 50926-11-9
- Formula
- InOSn
- MW
- 249.53 g/mol
ZX-017332
Indium tin oxide coated, glass substrate, 100 x 100 x 1.1 mm
- CAS
- 50926-11-9
- Formula
- InOSn
- MW
- 249.53 g/mol
ZX-017333
Indium tin oxide coated, glass substrate, 20 x 20 x 1 mm
- CAS
- 50926-11-9
- Formula
- InOSn
- MW
- 249.53 g/mol
ZX-017334
Indium tin oxide coated, glass substrate, 25 x 25 x 0.7 mm
- CAS
- 50926-11-9
- Formula
- InOSn
- MW
- 249.53 g/mol
ZX-017335
Indium tin oxide coated, glass substrate, Size: 10 x 10 x 1 mm
- CAS
- 50926-11-9
- Formula
- InOSn
- MW
- 249.53 g/mol
ZX-017336
Indium tin oxide sputtering target, diam. x thickness 2 inch × 1/8 inch, 99.9%
- CAS
- 50926-11-9
- Formula
- InOSn
- MW
- 249.53 g/mol
ZX-016195
Indium tin oxide sputtering target, diam. x thickness 4 inch × 10 mm, 99.99%
- CAS
- 50926-11-9
- Formula
- InOSn
- MW
- 249.53 g/mol
ZX-016196
Questions
Buying for electronics, PCB and semiconductors
What container types do high-purity acids ship in?
Electronic grade acids are filled into pre-cleaned HDPE or PFA bottles and drums so the container does not leach metals into the product. Bottle size and closure type affect cleanliness, so state your preferred pack when you request a quote.
Can I get a lot-specific trace metal report?
Yes. For electronic grade material the COA reports measured values for each specified element, usually by ICP-MS, rather than a generic statement of compliance. Ask for the full element list if your process is sensitive to a metal that is not routinely reported.
Do you supply sputtering targets or only chemicals?
Our focus is chemicals and high-purity metals in powder, granule or ingot form. Indium tin oxide and some metals can be supplied as powders or pieces for target fabrication. Finished bonded targets are quoted on request through specialist producers.
Other applications
Pharmaceutical Manufacturing and QCAgrochemicals and Crop ProtectionWater and Wastewater TreatmentPaints, Coatings and InksTextiles, Dyes and LeatherFood, Beverage and NutritionCosmetics and Personal CareResearch Labs and UniversitiesOil, Gas and PetrochemicalsPolymers, Plastics and RubberBatteries and Energy StorageMining, Mineral Processing and MetallurgyDiagnostics, Life Science and Biotech