Vanadium oxide sputtering target, diam. x thickness 4 inch x 0.125 inch, 99.5%
- CAS
- 1314-62-1
- Formula
- O5V2
- MW
- 181.88 g/mol
ZX-016339
Metals & Alloys
Sputtering Targets & Evaporation Materials
Metal, oxide and alloy sputtering targets plus evaporation pellets and pieces in standard and custom sizes for thin-film deposition.
Vanadium sputtering target, diam. × thickness 2 inch × 0.125 inch, 99.95%
- CAS
- 7440-62-2
- Formula
- V
- MW
- 50.94 g/mol
ZX-016344
Vanadium sputtering target, diam. × thickness 2 inch × 0.250 inch, 99.9%
- CAS
- 7440-62-2
- Formula
- V
- MW
- 50.94 g/mol
ZX-016345
Vanadium sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9%
- CAS
- 7440-62-2
- Formula
- V
- MW
- 50.94 g/mol
ZX-016342
Vanadium sputtering target, diam. x thickness 50.8 mm x 6.35 mm, 99.5%
- CAS
- 7440-62-2
- Formula
- V
- MW
- 50.94 g/mol
ZX-016343
Yttrium oxide sputtering target, diam. x thickness 2 inch x 0.125 inch, 99.99%
- CAS
- 1314-36-9
- Formula
- O3Y2
- MW
- 225.81 g/mol
ZX-016346
Yttrium oxide sputtering target, diam. x thickness 2 inch x 0.250 inch, 99.99%
- CAS
- 1314-36-9
- Formula
- O3Y2
- MW
- 225.81 g/mol
ZX-016347
Yttrium sputtering target, diam. × thickness 2 inch × 0.125 inch, 99.99%
- CAS
- 7440-65-5
- Formula
- Y
- MW
- 88.91 g/mol
ZX-016348
Zinc oxide sputtering target, diam. × thickness 2 inch × 2 mm, 99.9%
- CAS
- 1314-13-2
- Formula
- OZn
- MW
- 81.4 g/mol
ZX-016349
Zinc oxide sputtering target, diam. × thickness 50.8 mm × 3 mm, 99.9%
- CAS
- 1314-13-2
- Formula
- OZn
- MW
- 81.4 g/mol
ZX-016350
Zinc sputtering target, diam. x thickness 2 inch x 0.125 inch, 99.99%
- CAS
- 7440-66-6
- Formula
- Zn
- MW
- 65.4 g/mol
ZX-016351
Zinc sputtering target, diam. x thickness 25.4mm (1.0in) x 1 mm, 99.9%
- CAS
- 7440-66-6
- Formula
- Zn
- MW
- 65.4 g/mol
ZX-016352
Zinc sputtering target, diam. x thickness 4 inch x 6 mm, 99.995%
- CAS
- 7440-66-6
- Formula
- Zn
- MW
- 65.4 g/mol
ZX-016353
Zinc sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7440-66-6
- Formula
- Zn
- MW
- 65.4 g/mol
ZX-016354
Zinc sulphide (backing plate copper) manganse doped, sputtering target, diam. x thickness 50 mm × 5 mm, 99.9%
- CAS
- 1314-98-3
- Formula
- SZn
- MW
- 97.4 g/mol
ZX-016355
Zinc sulphide (backing plate copper) sputtering target, diam. x thickness 50 mm × 5 mm, 99.9%
- CAS
- 1314-98-3
- Formula
- SZn
- MW
- 97.4 g/mol
ZX-016356
Zirconium sputtering target, diam. × thickness 2 inch × 0.125 inch, 99.95%
- CAS
- 7440-67-7
- Formula
- Zr
- MW
- 91.22 g/mol
ZX-016359
Zirconium sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9%
- CAS
- 7440-67-7
- Formula
- Zr
- MW
- 91.22 g/mol
ZX-016357
Zirconium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7440-67-7
- Formula
- Zr
- MW
- 91.22 g/mol
ZX-016358
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