Tin sputtering target, diam. x thickness 3 inch × 3 mm, 99.99%
- CAS
- 7440-31-5
- Formula
- Sn
- MW
- 118.71 g/mol
ZX-016315
Metals & Alloys
Sputtering Targets & Evaporation Materials
Metal, oxide and alloy sputtering targets plus evaporation pellets and pieces in standard and custom sizes for thin-film deposition.
Titanium dioxide sputtering target, dia x thickness 3 inch x 3 mm, 99.99%
- CAS
- 13463-67-7
- Formula
- O2Ti
- MW
- 79.87 g/mol
ZX-016318
Titanium dioxide sputtering target, dia x thickness 3 inch x 5 mm, 99.99%
- CAS
- 13463-67-7
- Formula
- O2Ti
- MW
- 79.87 g/mol
ZX-016319
Titanium nitride sputtering target, diam. x thickness 4 inch x 6 mm, 99.5%
- CAS
- 25583-20-4
- Formula
- NTi
- MW
- 61.87 g/mol
ZX-016320
Titanium sputtering target, diam. × thickness 1 inch × 4 mm, 99.99%
- CAS
- 7440-32-6
- Formula
- Ti
- MW
- 47.87 g/mol
ZX-016325
Titanium sputtering target, diam. × thickness 2 in. × 3 mm, 99.995%
- CAS
- 7440-32-6
- Formula
- Ti
- MW
- 47.87 g/mol
ZX-016326
Titanium sputtering target, diam. × thickness 2 inch × 0.125 inch, 99.995%
- CAS
- 7440-32-6
- Formula
- Ti
- MW
- 47.87 g/mol
ZX-016327
Titanium sputtering target, diam. × thickness 2 inch × 3 mm, 99.99%
- CAS
- 7440-32-6
- Formula
- Ti
- MW
- 47.87 g/mol
ZX-016328
Titanium sputtering target, diam. × thickness 250 mm × 3 mm, 99.95%
- CAS
- 7440-32-6
- Formula
- Ti
- MW
- 47.87 g/mol
ZX-016329
Titanium sputtering target, diam. × thickness 3 in. × 2.5 mm, 99.95%
- CAS
- 7440-32-6
- Formula
- Ti
- MW
- 47.87 g/mol
ZX-016330
Titanium sputtering target, diam. × thickness 3 inch × 5 mm, 99.99%
- CAS
- 7440-32-6
- Formula
- Ti
- MW
- 47.87 g/mol
ZX-016331
Titanium sputtering target, diam. × thickness 50 mm × 5 mm, 99.99%
- CAS
- 7440-32-6
- Formula
- Ti
- MW
- 47.87 g/mol
ZX-016332
Titanium sputtering target, diam. x thickness 25.4mm (1.0in) x 1 mm, 99.9%
- CAS
- 7440-32-6
- Formula
- Ti
- MW
- 47.87 g/mol
ZX-016322
Titanium sputtering target, diam. x thickness 4 inch x 4 mm, 99.99%
- CAS
- 7440-32-6
- Formula
- Ti
- MW
- 47.87 g/mol
ZX-016323
Titanium sputtering target, diam. x thickness 4 inch x 6 mm, 99.995%
- CAS
- 7440-32-6
- Formula
- Ti
- MW
- 47.87 g/mol
ZX-016324
Tungsten sputtering target, diam. × thickness 2 inch × 0.125 inch, 99.95%
- CAS
- 7440-33-7
- Formula
- W
- MW
- 183.84 g/mol
ZX-016336
Tungsten sputtering target, diam. × thickness 2 inch × 3 mm, 99.9%
- CAS
- 7440-33-7
- Formula
- W
- MW
- 183.84 g/mol
ZX-016337
Tungsten sputtering target, diam. × thickness 50 mm × 6 mm, 99.95%
- CAS
- 7440-33-7
- Formula
- W
- MW
- 183.84 g/mol
ZX-016338
Tungsten sputtering target, diam. x thickness 1 inch x 0.125 inch, 99.95%
- CAS
- 7440-33-7
- Formula
- W
- MW
- 183.84 g/mol
ZX-016334
Tungsten sputtering target, diam. x thickness 4 inch x 4 mm, 99.99%
- CAS
- 7440-33-7
- Formula
- W
- MW
- 183.84 g/mol
ZX-016335
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