Chromium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7440-47-3
- Formula
- Cr
- MW
- 52 g/mol
ZX-016118
Metals & Alloys
Sputtering Targets & Evaporation Materials
Metal, oxide and alloy sputtering targets plus evaporation pellets and pieces in standard and custom sizes for thin-film deposition.
Cobalt sputtering target, diam. x thickness 2 inch x 1 mm, 99.99%
- CAS
- 7440-48-4
- Formula
- Co
- MW
- 58.93 g/mol
ZX-016126
Cobalt sputtering target, diam. x thickness 2 inch x 3 mm, 99.95%
- CAS
- 7440-48-4
- Formula
- Co
- MW
- 58.93 g/mol
ZX-016127
Cobalt sputtering target, diam. x thickness 25.4mm (1.0in) x 1 mm, 99.9%
- CAS
- 7440-48-4
- Formula
- Co
- MW
- 58.93 g/mol
ZX-016128
Cobalt sputtering target, diam. x thickness 3 inch x 2 mm, 99.95%
- CAS
- 7440-48-4
- Formula
- Co
- MW
- 58.93 g/mol
ZX-016129
Cobalt sputtering target, diam. x thickness 4 inch x 4 mm, 99.99%
- CAS
- 7440-48-4
- Formula
- Co
- MW
- 58.93 g/mol
ZX-016130
Cobalt sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7440-48-4
- Formula
- Co
- MW
- 58.93 g/mol
ZX-016131
Cobalt sputtering target, diam. x thickness 50.8 mm x 1 mm, 99.95%
- CAS
- 7440-48-4
- Formula
- Co
- MW
- 58.93 g/mol
ZX-016132
Copper sputtering target, diam. × thickness 2 inch × 0.125 inch, 99.99%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
ZX-016140
Copper sputtering target, diam. × thickness 2 inch × 0.25 inch, 99.995%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
ZX-016141
Copper sputtering target, diam. x thickness 2 inch x 3 mm, 99%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
ZX-016134
Copper sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
ZX-016135
Copper sputtering target, diam. x thickness 3 inch x 3 mm, 99.99%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
ZX-016136
Copper sputtering target, diam. x thickness 50 mm x 5 mm, 99.99%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
ZX-016137
Copper sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
ZX-016138
Copper sputtering target, diam. x thickness 50.8 mm x 3 mm, 99.99%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
ZX-016139
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