Gold sputtering target, diam. × thickness 50.8 mm × 3 mm, 99.99%
- CAS
- 7440-57-5
- Formula
- Au
- MW
- 196.97 g/mol
ZX-016171
Metals & Alloys
Sputtering Targets & Evaporation Materials
Metal, oxide and alloy sputtering targets plus evaporation pellets and pieces in standard and custom sizes for thin-film deposition.
Gold sputtering target, diam. × thickness 50.8 mm × 6 mm, 99.99%
- CAS
- 7440-57-5
- Formula
- Au
- MW
- 196.97 g/mol
ZX-016172
Gold sputtering target, diam. × thickness 57 mm × 0.1 mm, 99.9%
- CAS
- 7440-57-5
- Formula
- Au
- MW
- 196.97 g/mol
ZX-016173
Gold sputtering target, diam. × thickness 57 mm × 0.1 mm, 99.99%
- CAS
- 7440-57-5
- Formula
- Au
- MW
- 196.97 g/mol
ZX-016174
Gold sputtering target, diam. × thickness 57 mm × 0.2 mm, 99.99%
- CAS
- 7440-57-5
- Formula
- Au
- MW
- 196.97 g/mol
ZX-016175
Gold sputtering target, diam. × thickness 57 mm × 0.3 mm, 99.9%
- CAS
- 7440-57-5
- Formula
- Au
- MW
- 196.97 g/mol
ZX-016176
Hafnium sputtering target dia x thickness 2 inch × 0.125 inch, ≥99.95%
- CAS
- 7440-58-6
- Formula
- Hf
- MW
- 178.49 g/mol
ZX-016186
Hafnium sputtering target dia x thickness 2 inch × 2 mm, ≥99.95%
- CAS
- 7440-58-6
- Formula
- Hf
- MW
- 178.49 g/mol
ZX-016187
Hafnium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7440-58-6
- Formula
- Hf
- MW
- 178.49 g/mol
ZX-016188
Indium sputtering target, diam. x thickness 25.4 mm x 10 mm, 99.99%
- CAS
- 7440-74-6
- Formula
- In
- MW
- 114.82 g/mol
ZX-016190
Indium sputtering target, diam. x thickness 25.4mm (1.0in) x 1 mm, 99.9%
- CAS
- 7440-74-6
- Formula
- In
- MW
- 114.82 g/mol
ZX-016191
Indium sputtering target, diam. x thickness 50 mm x 6 mm, 99.99%
- CAS
- 7440-74-6
- Formula
- In
- MW
- 114.82 g/mol
ZX-016192
Indium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7440-74-6
- Formula
- In
- MW
- 114.82 g/mol
ZX-016193
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