Niobium sputtering target, diam. × thickness 2 inch × 0.125 inch, 99.95%
- CAS
- 7440-03-1
- Formula
- Nb
- MW
- 92.91 g/mol
ZX-016245
Inorganics & Metals
Metals & Alloys
High-purity metals and alloys as powders, foils, wires, rods, granules and sputtering targets for research, coating and manufacturing.
Niobium sputtering target, diam. × thickness 2 inch × 0.250 inch, 99.95%
- CAS
- 7440-03-1
- Formula
- Nb
- MW
- 92.91 g/mol
ZX-016246
Niobium sputtering target, diam. × thickness 3 inch × 3 mm, 99.99%, with indium bonded Copper (Cu) backing plate of thickness 2mm
- CAS
- 7440-03-1
- Formula
- Nb
- MW
- 92.91 g/mol
ZX-015456
Niobium sputtering target, diam. x thickness 25 mm x 1.1 mm, 99.9%
- CAS
- 7440-03-1
- Formula
- Nb
- MW
- 92.91 g/mol
ZX-016242
Niobium sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9%
- CAS
- 7440-03-1
- Formula
- Nb
- MW
- 92.91 g/mol
ZX-016243
Niobium sputtering target, diam. x thickness 3 inch × 3 mm, 99.99%
- CAS
- 7440-03-1
- Formula
- Nb
- MW
- 92.91 g/mol
ZX-016244
Niobium, sputtering target, 99.95% (L x W x Thick 14 x 1 x 2 mm)
- CAS
- 7440-03-1
- Formula
- Nb
- MW
- 92.91 g/mol
ZX-016248
Palladium silver alloy sputtering target, (L x W x thick 700 x 25.4 x 2 mm), 99.95%
- Formula
- Pd:Ag;75:25wt%
ZX-016249
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