Indium tin oxide sputtering target, diam. x thickness 2 inch × 1/8 inch, 99.9%
- CAS
- 50926-11-9
- Formula
- InOSn
- MW
- 249.53 g/mol
ZX-016195
Metals & Alloys
Sputtering Targets & Evaporation Materials
Metal, oxide and alloy sputtering targets plus evaporation pellets and pieces in standard and custom sizes for thin-film deposition.
Indium tin oxide sputtering target, diam. x thickness 4 inch × 10 mm, 99.99%
- CAS
- 50926-11-9
- Formula
- InOSn
- MW
- 249.53 g/mol
ZX-016196
Iridium sputtering target, diam. x thickness 50.8 mm × 2 mm, 99.9%+
- CAS
- 7439-88-5
- Formula
- Ir
- MW
- 192.22 g/mol
ZX-016198
Iridium sputtering target, diam. x thickness 50.8 mm × 3.175 mm, 99.9%+
- CAS
- 7439-88-5
- Formula
- Ir
- MW
- 192.22 g/mol
ZX-016199
Iron sputtering target, diam. x thickness 2 inch x 0.250 inch, 99.95%
- CAS
- 7439-89-6
- Formula
- Fe
- MW
- 55.84 g/mol
ZX-016200
Iron sputtering target, diam. x thickness 2 inch x 1 mm, 99.99%
- CAS
- 7439-89-6
- Formula
- Fe
- MW
- 55.84 g/mol
ZX-016201
Iron sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9%
- CAS
- 7439-89-6
- Formula
- Fe
- MW
- 55.84 g/mol
ZX-016202
Iron sputtering target, diam. x thickness 3 inch x 2 mm, 99.95%
- CAS
- 7439-89-6
- Formula
- Fe
- MW
- 55.84 g/mol
ZX-016203
Iron sputtering target, diam. x thickness 4 inch x 6 mm, 99.9%
- CAS
- 7439-89-6
- Formula
- Fe
- MW
- 55.84 g/mol
ZX-016204
Iron sputtering target, diam. x thickness 50 mm x 6 mm, 99.99%
- CAS
- 7439-89-6
- Formula
- Fe
- MW
- 55.84 g/mol
ZX-016205
Iron sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7439-89-6
- Formula
- Fe
- MW
- 55.84 g/mol
ZX-016206
Iron sputtering target, diam. x thickness 50.8 mm x 0.75 mm, 99.95%
- CAS
- 7439-89-6
- Formula
- Fe
- MW
- 55.84 g/mol
ZX-016207
Lead sputtering target, diam. x thickness 25.4mm (1.0in) x 1 mm, 99.9%
- CAS
- 7439-92-1
- Formula
- Pb
- MW
- 207 g/mol
ZX-016208
Lithium phosphate sputtering target, dia x thickness 3 inch x 3 mm, 99.99%
- CAS
- 10377-52-3
- Formula
- Li3O4P
- MW
- 115.9 g/mol
ZX-016209
Lutetium sputtering target, diam. x thickness 55 mm × 3 mm, 99.9%
- CAS
- 7439-94-3
- Formula
- Lu
- MW
- 174.97 g/mol
ZX-016210
Lutetium sputtering target, diam. x thickness 55 mm × 3 mm, 99.99%
- CAS
- 7439-94-3
- Formula
- Lu
- MW
- 174.97 g/mol
ZX-016211
Lutetium sputtering target, diam. x thickness 75 mm × 3 mm, 99.9%
- CAS
- 7439-94-3
- Formula
- Lu
- MW
- 174.97 g/mol
ZX-016212
Lutetium sputtering target, diam. x thickness 76.2 mm × 3 mm, 99%
- CAS
- 7439-94-3
- Formula
- Lu
- MW
- 174.97 g/mol
ZX-016213
Magnesium oxide sputtering target dia x thickness 2 inch × 2 mm, ≥99.9%
- CAS
- 1309-48-4
- Formula
- MgO
- MW
- 40.3 g/mol
ZX-016215
Magnesium oxide sputtering target dia x thickness 3 inch × 2 mm, ≥99.95%
- CAS
- 1309-48-4
- Formula
- MgO
- MW
- 40.3 g/mol
ZX-016216
Magnesium sputtering target, diam. x thickness 25.4mm (1.0in) x 1 mm, 99.9%
- CAS
- 7439-95-4
- Formula
- Mg
- MW
- 24.3 g/mol
ZX-016217
Magnesium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7439-95-4
- Formula
- Mg
- MW
- 24.3 g/mol
ZX-016218
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