Manganese sputtering target, diam. x thickness 2 inch x 0.250 inch, 99.95%
- CAS
- 7439-96-5
- Formula
- Mn
- MW
- 54.94 g/mol
ZX-016219
Metals & Alloys
Sputtering Targets & Evaporation Materials
Metal, oxide and alloy sputtering targets plus evaporation pellets and pieces in standard and custom sizes for thin-film deposition.
Manganese sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9%
- CAS
- 7439-96-5
- Formula
- Mn
- MW
- 54.94 g/mol
ZX-016220
Manganese sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7439-96-5
- Formula
- Mn
- MW
- 54.94 g/mol
ZX-016221
Molybdenum sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9%
- CAS
- 7439-98-7
- Formula
- Mo
- MW
- 95.95 g/mol
ZX-016224
Molybdenum sputtering target, diam. x thickness 3 inch x 2.5 mm, 99.95%
- CAS
- 7439-98-7
- Formula
- Mo
- MW
- 95.95 g/mol
ZX-016225
Molybdenum sputtering target, diam. x thickness 3 inch x 3 mm, 99.99%
- CAS
- 7439-98-7
- Formula
- Mo
- MW
- 95.95 g/mol
ZX-016226
Molybdenum sputtering target, diam. x thickness 4 inch x 4 mm, 99.99%
- CAS
- 7439-98-7
- Formula
- Mo
- MW
- 95.95 g/mol
ZX-016227
Molybdenum sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7439-98-7
- Formula
- Mo
- MW
- 95.95 g/mol
ZX-016228
Molybdenum sputtering target, diam. x thickness 50.8 mm x 3.125 mm, 99.95%
- CAS
- 7439-98-7
- Formula
- Mo
- MW
- 95.95 g/mol
ZX-016229
Nickel oxide, sputtering target, diam. x thickness 2 inch x 0.125 inch, 99.9%
- CAS
- 1313-99-1
- Formula
- NiO
- MW
- 74.69 g/mol
ZX-016231
Nickel oxide, sputtering target, diam. x thickness 3 inch x 1.5 mm, 99.9%
- CAS
- 1313-99-1
- Formula
- NiO
- MW
- 74.69 g/mol
ZX-016232
Nickel sputtering target dia x thickness 2 inch × 1.5 mm, ≥99.99%
- CAS
- 7440-02-0
- Formula
- Ni
- MW
- 58.69 g/mol
ZX-016234
Nickel sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9%
- CAS
- 7440-02-0
- Formula
- Ni
- MW
- 58.69 g/mol
ZX-016235
Nickel sputtering target, diam. x thickness 3 inch dia x 2.5 mm, 99.95%
- CAS
- 7440-02-0
- Formula
- Ni
- MW
- 58.69 g/mol
ZX-016236
Nickel sputtering target, diam. x thickness 4 inch x 4 mm, 99.99%
- CAS
- 7440-02-0
- Formula
- Ni
- MW
- 58.69 g/mol
ZX-016237
Nickel sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7440-02-0
- Formula
- Ni
- MW
- 58.69 g/mol
ZX-016238
Nickel-chromium alloy, sputtering target, 3 inch dia x 2 mm thick, 99.95%
- CAS
- 11106-97-1
- Formula
- CrNi
- MW
- 110.69 g/mol
ZX-016239
Niobium nitride sputtering target, diam. x thickness 4 inch x 6 mm, 99.5%
- CAS
- 24621-21-4
- Formula
- NNb
- MW
- 106.91 g/mol
ZX-016241
Niobium sputtering target, diam. × thickness 2 inch × 0.125 inch, 99.95%
- CAS
- 7440-03-1
- Formula
- Nb
- MW
- 92.91 g/mol
ZX-016245
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